Launch of Dual Capture Technology - 25/11/2011
Blom is set to transform its aerial surveying services at this year's ELMF 2011 exhibition which is being held on 29th and 30th November 2011 in Salzburg, Austria: the company will introduce dual capture technology to simultaneously capture digital photography and topographical Lidar data.
The introduction of this time-saving, cost-effective equipment has the potential to bring wide-scale and radical changes to the nature of data capture in the digital imaging sector, as Blom UK's Lidar manager Hamish Grierson comments. He sees the demand for higher-quality resources and the need for improved data capture efficiency, and he has seen the techniques of aerial surveying put under the microscope for this reason.
Once all data capture has been completed and processed, the Lidar and aerial imagery is added onto a data archive as part of a new set of tools called BlomMETRO, creating a unique, high-specification and current data set of urban areas.
Other benefits include reduced costs, faster delivery of data, reduced carbon footprint and all data captured at the same time for multiple uses.
Blom is on stand 22 at the ELMF 2011.
Last updated: 17/08/2019